About Our Faculty & Staff
Physics & Engineering Department

About Dr. Jeff Jessing

Dr. Jessing joined the faculty in 2013. He is currently investigating the unique electrical and optical properties of porous silicon, with an eye to the development of several high impact technologies in the fields of sensors, computing, and instrumentation. Jessing has considerable experience in research and manufacturing environments, including the development, fabrication, and characterization of novel electronic & optical materials/devices, microelectromechanical systems (MEMS) and integrated microelectromechanical systems (IMEMS), novel methods of characterization and design of microsensors, application of thin film processing techniques to the development of bio-MEMS and bio-electronic components, characterization and modeling of process dependent radiation effects in CMOS, and process/device modeling.  
 
Prior to joining the faculty at Fort Lewis College, Jessing was the vice president of research and co-owner of Sitanium, a company involved in the development and technology transfer of novel microfabricated medical devices, an assistant professor at Boise State University, and a technical staff member at Sandia National Laboratories in Albuquerque. He is a member of the Institute for Electrical and Electronics Engineers and the Phi Kappa Phi Honor Society. 

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Grants / Awards

NSF PREM: The Partnership for Research and Education in Materials for Functional Nanomaterials

• This is a multi-institution grant that provides for the education and training of students (undergraduate and graduate) in the area of material science.
• Senior Personnel: Jeff Jessing, PI: Ryan Haaland
• Awarded: August 2018 (active)

NSF REU: Enriching the Undergraduate Research Experience for Native American Students

• “Development of a Porous Silicon Rocket”
• Co-PI: Jeff Jessing, PI: Megan Paciaroni
• Awarded: August 2017 (active)
• $354,663

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Books and Authored Chapters

“CMOS, Circuit Design, Layout, and Simulation”, R. Jacob Baker, Chapter 7:  CMOS Fabrication, 4th Ed., Wiley 2018, submitted to publisher.  This is a complete rewrite and update of a chapter on the latest developments in the fabrication of advanced integrated circuits.

“CMOS, Circuit Design, Layout, and Simulation”, R. Jacob Baker, Chapter 7:  CMOS   Fabrication, 3rd Ed., Wiley 2010, ISBN 978-0470881323.

“The VLSI Handbook”, edited by Wai-Kai Chen, Chapter 12:  CMOS Fabrication, CRC Press 2007, ISBN 9780849341991.

“CMOS, Circuit Design, Layout, and Simulation”, R. Jacob Baker, Chapter 7:  CMOS   Fabrication, 2nd Ed., Wiley 2005, ISBN 978-0471700555.

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Selected Publications and Presentations

S. Mancha, A. Hamilton, J. Jessing, D. Blake, G. Crawford, and Y. Li, “Fabrication and Optimization of a Prototype Lung-on-Chip”, Undergraduate Research Symposium (poster), Fort Lewis College (April 2018).

T. Flynn and J. Jessing, “Development and Characterization of Electron Beam Lithography”, Undergraduate Research Symposium (poster and presentation), Fort Lewis College (April 2018).

T. Flynn, D. Bunn, J. Jessing, and G. Crawford, “Characterization and Modeling of Electron Field Emission from Porous Silicon”, presented at Sandia National Laboratories (August 2017).

A. Tomaselli, J. Jessing, and G. Crawford, “Characterization of Electron Field Emission from Porous Silicon, Undergraduate Research Symposium (poster and presentation), Fort Lewis College (April 2017).

G. Murray, G. Crawford, and J. Jessing, “Modeling and Characterizing Porous Silicon Reflectance”, Undergraduate Research Symposium (poster and presentation), Fort Lewis College (April 2016).

T. Wecker, J. Jessing, and G. Crawford, “Electron Field Emission from Porous Silicon”, Undergraduate Research Symposium (poster), Fort Lewis College (April 2016).

K. Graves, J. Jessing, and G. Crawford, “Formation and Characterization of Porous Silicon”, Undergraduate Research Symposium (poster), Fort Lewis College (April 2015).

V. Fusco and J. Jessing, “To See or Not to See:  Micromachined Silicon Blades for LASIK Surgery, 2004 NIH BRIN Conference (August 2004).

P. Reddy and J. Jessing, “Pattern Alignment Effects in Through-Wafer Bulk Micromachining of (100) Silicon,” Proceedings of the 2004 IEEE Workshop on Microelectronics and Electron Device, 89 (April 2004).

G. Gatlin, C. Eskridge, J. Brinkerhoff, J. Fife, and J. Jessing, “Process Development of Electron Beam Lithography in an Academic Environment,” Proceedings of the 2004 IEEE Workshop on Microelectronics and Electron Devices, 117 (April 2004).

J. Hartman, J. Baker, M. Gribb, J. Jessing, A. Moll, W. Prouty, D. Russell, and H. Hill, “A miniaturized Ion Mobility Spectrometer (IMS) sensor for wireless operation,” presented at the Frontiers in Assessment Methods for the Environment Symposium, Minneapolis, Minnesota (August 2003).

T. Vamsi Krishna, J. R. Jessing, D. D. Russell, J. Scaggs, L. R. Warner and J. A. Hartman, “Modeling and Design of Polythiophene Gate Electrode ChemFETs for Environmental Pollutant Sensing,” Proceedings of the 15th Biennial IEEE UGIM, 271 (July 2003).

M. Okandan, K. O. Wessendorf, T. R. Christenson, M. Rightley, R. J. Shul, J. Jessing, M. Baker, P. Galambos, "Micromachined Conformal Electrode Array for Retinal Prosthesis Application," Proceedings of SPIE, vol. 4982 (January 2003).

J. R. Jessing and P. Tangyunyong, “Poly Stringers:  a Yield Limiting Defect in a 0.5um  Radiation-Hardened CMOS Technology,” presented at the 27th International Symposium for Testing and Failure Analysis, Phoenix, AZ (November 2002). 

M. Okandan, J. Jessing, T. Christenson, K. Wessendorf, M. Baker, P. Galambos, and R. Myers, “Micromachined Conformal Electrode Array for Retinal Prosthesis Application,” submitted to 2nd Annual International IEEE-EMBS Special Topic Conference on Microtechnologies in Medicine and Biology, Madison, WI (May 2002).

D. M. Fleetwood, A. N. Campbell, P. Tangyunyong, C. E. Hembree, J. R. Jessing, J. M. Soden, N. Antoniou, “Mechanisms of Focused Ion Beam Damage to MOS Integrated Circuits,” presented at IEEE NSREC (July 2000).

D. M. Fleetwood, A. N. Campbell, C. E. Hembree, P. Tangyunyong, J. R. Jessing, and J. M. Soden, “Focused Ion Beam Damage to MOS Integrated Circuits,” Sandia Report, SAND2000-1163C (March 2000).

D. R. Myers, J. R. Jessing, O. B. Spahn, and M. R. Shaneyfelt, “Investigations of the Impact of the Process Integration of the Deposited Magnetic Films for Magnetic Memory Technologies on Radiation Hardened CMOS Devices and Circuits,” Sandia Report SAND2000-0218 (January 2000).

AN. Campbell, P. Tangyunyong, J. R. Jessing, C. E. Hembree, D. M. Fleetwood, S.  E. Swanson, J. M. Soden, N. Antoniou, W. E. Vanderlinde, M. T. Abramo, “Focused Ion Beam Induced Effects on MOS Transistor Parameters,” 25th International Symposium for Testing and Failure Analysis, Santa Clara, CA (November 1999).

H. R. Kim, J. R. Jessing, and D. L. Parker, “Emission Stability of Anodized Silicon Field Emitter Arrays,” Journal of Vacuum Science Technology B, 17 (2), 601 (March 1999).

J. R. Jessing, H. R. Kim, D. L. Parker, and M. H. Weichold, “Fabrication and Characterization of Gated Porous Silicon Cathode Field Emission Arrays,” Journal of Vacuum Science Technology B, 16 (2), 777 (March/April 1998).

H. R. Kim, J. R. Jessing, and D. L. Parker, “Porous Silicon Field Emission Arrays with Built-in Spacer,” Journal of Vacuum Science Technology B, 16 (2) (March/April 1998). 

J. R. Jessing, “Gated Porous Silicon Cathode Field Emission Arrays,” presented at the Tenth International IEEE Vacuum Microelectronics Conference, Kyongju, Korea (August 1997).

J. R. Jessing, D. L. Parker, and M. H. Weichold, “Porous Silicon Field Emission Cathode Development,” Journal of Vacuum Science Technology B, 14 (3), 1899 (May/June 1996).